The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2002

Filed:

Jan. 11, 2000
Applicant:
Inventors:

Toshiaki Kunieda, Minoo, JP;

Toshibumi Kamiyama, Tsuyama, JP;

Sadayuki Okazaki, Hirakata, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/424 ; C23C 1/412 ; C23C 1/428 ;
U.S. Cl.
CPC ...
C23C 1/424 ; C23C 1/412 ; C23C 1/428 ;
Abstract

There is provided a method of forming a thin functional film by vacuum vapor deposition in which a functional material is heated from the above thereof so that bumping or splashing of the functional material is not caused upon evaporation of the functional material. Specifically, the functional material is placed in a receiving vessel and the functional material is heated by a heater which is located above the functional material so that bumping or splashing is suppressed, whereby a uniform functional film is produced without a pinhole.


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