The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2002

Filed:

Jan. 30, 1998
Applicant:
Inventor:

Robert G. Cords, Santa Cruz, CA (US);

Assignee:

Diverseylever, Inc., Edgewater, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/04 ; B08B 9/032 ; D06F 3/902 ;
U.S. Cl.
CPC ...
B08B 3/04 ; B08B 9/032 ; D06F 3/902 ;
Abstract

A supply tube isolation system for use with a chemical delivery system includes a feedback tube connected between the manifold and each of the supply tubes connected between the chemical supply containers and the chemical pumps of the chemical delivery system. A controllable valve means is provided at or near the junction of the feedback tube and the supply tube so as to effectively segment the supply tube into first and second portions, where the first supply tube portion is that which is connected between the valve means and the manifold, and the second tube portion is that which is connected between the valve means and the chemical supply container. During delivery of the chemical to one or more destinations within the delivery system, the valve means is positioned so as to close the feedback tube and connect the first and second portions of the supply tube. During a subsequent flushing of the delivery system with water, the valve means is positioned so as to connect the first portion of the supply tube to the feedback tube and close the second portion of the supply tube. In this manner, water flushed through the manifold and chemical pump to remove chemical residue therein does not contact chemicals within the supply containers.


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