The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2002
Filed:
Dec. 28, 1999
Hideaki Nomura, Kanagawa, JP;
Hideo Iwasaki, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
There is disclosed a developing processing method and apparatus in which developing processing is carried out with a developing solution being jetted toward an emulsion surface of a photosensitive material from jetting holes of a blowoff chamber. Only one blowoff chamber is disposed in a developing tank and conveying roller sets are disposed at both sides of the blowoff chamber. The photosensitive material is horizontally conveyed above the blowoff chamber by the conveying roller sets. Due to the number of components of the developing processing tank being thus reduced, the apparatus can be made small in size. Positions where the photosensitive material is nipped by the roller sets are located within a processing solution, and therefore, there is no possibility of the photosensitive material being nipped and conveyed in a state in which outer peripheral surfaces of the rollers are wet non-uniformly with the processing solution. As a result, non-uniform processing is prevented.