The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2002
Filed:
Jun. 12, 2000
Satoshi Watanabe, Nakakubiki-gun, JP;
Osamu Watanabe, Nakakubiki-gun, JP;
Tomoyoshi Furihata, Usui-gun, JP;
Yoshihumi Takeda, Nakakubiki-gun, JP;
Shigehiro Nagura, Nakakubiki-gun, JP;
Toshinobu Ishihara, Nakakubiki-gun, JP;
Tsuguo Yamaoka, Funabashi, JP;
Shin-Etsu Chemical, Co., Ltd., Tokyo, JP;
Abstract
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C—O—C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group ≡C—COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile