The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2002
Filed:
May. 01, 2000
Applicant:
Inventors:
J. Fung Chen, Cupertino, CA (US);
John S. Petersen, Austin, TX (US);
Assignee:
ASML Masktools Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G06F 1/750 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G06F 1/750 ;
Abstract
Method for utilizing halftoning structures to manipulate the relative magnitudes of diffraction orders to ultimately construct the desired projected-image. At the resolution limit of the mask maker, this is especially useful for converting strong shifted, no 0 diffraction order, equal line and space chromeless phase edges to weak phase shifters that have some 0 order. Halftoning creates an imbalance in the electric field between the shifted regions and therefore results in the introduction of the 0 diffraction order.