Method of manufacturing a pellicle

Abstract

According to the present invention, a method of manufacturing a pellicle and a jig for manufacturing a pellicle are provided. The method of manufacturing a pellicle of the present invention comprising the steps of: temporarily coating a thin film which is a constituting member of a pellicle which is a dust cover for a mask used in patterning in manufacturing a semiconductor device or a liquid crystal display plate, on a frame larger than a specified frame which is another constituting member of the pellicle; coating an adhesive on said specified frame in advance; overlapping said larger frame on said specified frame coated with said adhesive; adhering said thin film temporarily coated on said larger frame to said specified frame with said adhesive; transferring said thin film coated on said larger frame to said specified frame from said larger frame; and cutting off a portion of said transferred thin film, the portion of which is protruded from said specified frame, with a physical trimming means, wherein a coating material consisting of an organic solvent and a specified resin dissolved therein is supplied to a cut-off portion intended to be cut off, by said physical trimming means, at the same time or before cutting off said protruded thin film with said physical trimming means.