The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2002
Filed:
Sep. 16, 1999
David P. Ramer, Reston, VA (US);
Jack C. Rains, Jr., Herndon, VA (US);
Richard S. Bagwell, Chesterfield, VA (US);
George David Crowley, III, Chevy Chase, MD (US);
Advanced Optical Technologies, L.L.C., McLean, VA (US);
Abstract
A system utilizing direct-view illumination of selected regions together with principles of constructive occlusion (diffuse reflectivity in a mask and cavity structure) provides a tailored radiation intensity distribution adapted to meet the requirements of certain special applications. The direct illumination provides high intensity illumination for certain desired regions. However, some radiant energy from the system source(s) reflects and diffuses within the volume between the mask and the cavity. The mask constructively occludes the aperture of the cavity. The reflected energy emerging from between the mask and cavity provides a desired illumination, for example at a much lower intensity, for regions not covered by the direct illumination. For example, in an embodiment wherein the direct illumination provides light over angles near the system horizon, the constructive occlusion in the mask and cavity arrangement provides lower intensity illumination in regions at higher elevation angles up to the system axis.