The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2001
Filed:
Dec. 28, 1999
Hideaki Nomura, Kanagawa, JP;
Kazuo Sanada, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
In a developing processing method and apparatus in which developing processing is carried out in such a manner that a processing solution is jetted from jetting holes to an emulsion surface of a photosensitive material, a hole diameter of the jetting holes is set to be 0.5 mm to 0.9 mm. In this case, clogging of the jetting holes does not easily occur and the processing solution can be jetted from the jetting holes stably for a long period of time. Accordingly, non-uniform processing is rarely caused. Intervals between the jetting holes in the transverse direction of the photosensitive material are each in a range of 3.0 mm to 4.5 mm. The jetting holes are disposed in such a manner that jetting holes of adjacent three rows in a direction in which the photosensitive material is conveyed are located at different positions to form a staggered arrangement, and the three rows of jetting holes are formed repeatedly. By substantially shortening the intervals between the jetting holes in the transverse direction of the photosensitive material, non-uniform processing does not occur even in a photosensitive material having a large transverse direction, and a desired photographic property can be obtained.