The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2001
Filed:
Aug. 12, 1999
Takeshi Shibata, Minami-ashigara, JP;
Yuji Mihara, Minami-ashigara, JP;
Fuji Photo Film Co., Ltd., Minami-Ashigara, JP;
Abstract
There is disclosed a method for forming an image on a light-sensitive material having on a base at least a light-sensitive silver halide emulsion and a binder, which comprises, subjecting at least one light-sensitive layer to exposure to light, by using an exposure head that has a plurality of different light sources for emitting lights in respective specific wavelength regions correspondingly to adjacent exposure picture elements, to form an image, wherein, in the specific wavelength regions from the shortest wavelength to the longest wavelength for the respective plurality of light sources to be used, the change in sensitivity of the light-sensitive material in the spectral sensitivity curve obtained by plotting the sensitivities of the light-sensitive material in terms of the specific wavelength regions including the wavelengths in centers of gravity of respective light sources is 0.01 log E/nm or less. According to the method, the unevenness of exposure density resulting from a plurality of exposure light sources can be improved.