The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2001

Filed:

Mar. 13, 2000
Applicant:
Inventors:

Junichi Murakami, Aichi, JP;

Yutaka Tai, Aichi, JP;

Kazuki Yoshimura, Aichi, JP;

Kazuo Igarashi, Aichi, JP;

Sakae Tanemura, Aichi, JP;

Masahiro Goto, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/66 ;
U.S. Cl.
CPC ...
G11B 5/66 ;
Abstract

The present invention provides a method for producing layered aluminum fine particles, and applications to single electron tunneling quantum devices, and the present invention further relates to a method for producing spherical metallic aluminum fine particles (layered aluminum fine particles), characterized in that metallic aluminum is supplied into a mixed gas of helium and 1×10,to 3×10,torr water vapor by sputtering induced by argon gas discharge to generate aggregates, after which this product is released into a vacuum to generate single crystals in which the surface layer is covered with alumina.


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