The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2001

Filed:

Oct. 13, 2000
Applicant:
Inventors:

Shigeaki Ono, Utsunomiya, JP;

Shinya Tanaka, Tokyo, JP;

Toshiaki Okumura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/14 ;
U.S. Cl.
CPC ...
A61B 3/14 ;
Abstract

Fundus examination is effected by the steps of irradiating the fundus of an examined eye with a measuring beam through a deflector, irradiating the fundus of the eye with a tracking beam through the deflector to thereby obtain tracking information, and controlling the deflector on the basis of the tracking information and executing tracking, calculating a position at which the reliability of a signal obtained by a light receiving system is relatively improved during the tracking, and controlling the deflector so that the measuring beam may be irradiated to this position; and frequency-analyzing the signal obtained by the light receiving system and calculating the velocity of blood flow. The aforementioned reliability is evaluated by means of the SN ratio and quality value of the signal.


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