The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 2001

Filed:

Oct. 06, 1999
Applicant:
Inventors:

Theodore H. Smick, Essex, MA (US);

Marvin Farley, Ipswich, MA (US);

Geoffrey Ryding, Manchester, MA (US);

Shu Satoh, Byfield, MA (US);

Peter Rose, Rockport, MA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21F 5/02 ; G21F 5/10 ;
U.S. Cl.
CPC ...
G21F 5/02 ; G21F 5/10 ;
Abstract

An ion source assembly,is disclosed, the assembly comprising a source sub assembly having an ion source,, an extraction electrode,and an electrically insulating high voltage bushing,to support the extraction electrode,relative to the ion source,. The ion source assembly further includes a chamber,having an exit aperture to allow egress of ions to an ion implanter. The chamber,encloses one or more further electrodes,. The source sub assembly is mounted to the chamber,via a hinge,. This allows ready access to the inner walls of the chamber,, which in turn allows easier maintenance and cleaning of the further electrodes,as well as the inner walls of the chamber,. Preferably, a liner,is employed on the inner walls of the chamber


Find Patent Forward Citations

Loading…