The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2001
Filed:
Dec. 02, 1998
Zhijiang Wang, Diamond Bar, CA (US);
Junhua Pan, Jiangsu, CH;
Other;
Abstract
A novel projection lithography camera is disclosed with a large field area and large numerical aperture. The camera comprises only two aspheric mirrors with a two-reflection configuration. The two mirrors are arranged on a common axis of symmetry such that efficient use of extreme ultraviolet radiation can be achieved. In one preferred embodiment, a reduced image of mask is formed by reflection of the two mirrors on a wafer with feature sizes less than 0.05 &mgr;m over a field larger than 22 mm×22 mm with the NA being larger than 0.22. The system is appropriate for EUV steppers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile