The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2001
Filed:
Sep. 24, 1998
Applicant:
Inventors:
E. Henry Stevens, Colorado Springs, CO (US);
Richard Pfeiffer, Bigfork, MT (US);
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 1/304 ; H01L 2/1461 ;
U.S. Cl.
CPC ...
C09K 1/304 ; H01L 2/1461 ;
Abstract
A process for removing at least one thin-film layer from a surface of a workpiece pursuant to manufacturing a microelectronic interconnect or component is set forth. Generally stated, the process comprises the oxidation of at least a portion of the at least one thin-film layer and the etching of the oxidized thin-film layer using an etchant that selectively etches primarily the oxidized thin-film layer.
Stevens, E.. (2001). Process for etching thin-film layers of a workpiece used to form microelectric circuits or components (U.S. Patent No. 6331490). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6331490
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile