The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2001
Filed:
Apr. 28, 1999
Applicant:
Inventor:
Ki-Soon Bae, Seoul, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 ;
U.S. Cl.
CPC ...
G03F 7/00 ;
Abstract
There is provided a method for fabricating a semiconductor device in which a plurality of adjacent contacts are formed on a plurality of regions having the same layout. The layout is divided into at least two groups, and the contacts are formed on the regions by using masks which are designed to have different sizes from each other by the group. By differentiating the mask sizing factor of the contact pattern by the group on the mask, it is possible to minimize the problem that the contact is not opened at the region where a global step difference on a wafer is significant and to enhance a process margin of photolithography.