The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2001
Filed:
Jul. 05, 2000
Applicant:
Inventors:
Daisuke Kojima, Kanagawa-ken, JP;
Genji Imai, Kanagawa-ken, JP;
Jun Akui, Kanagawa-ken, JP;
Hideo Kogure, Kanagawa-ken, JP;
Osamu Isozaki, Kanagawa-ken, JP;
Assignee:
Kansai Paint Co., Ltd., Hyogo-ken, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/029 ; G03F 7/30 ;
U.S. Cl.
CPC ...
G03F 7/029 ; G03F 7/30 ;
Abstract
An organic solvent based photocurable resist composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X],[Y],—B, where X is represented by the formula:
Kojima, Daisuke. (2001). Organic-solvent-based photocurable resist composition and resist pattern-forming method (U.S. Patent No. 6331376). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6331376
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile