The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2001

Filed:

Mar. 24, 2000
Applicant:
Inventors:

Douglas Sojourner, Fremont, CA (US);

Craig Robson, Sunnyvale, CA (US);

Harold Dean Lewis, Ft. Collins, CO (US);

Assignee:

Agilent Technologies, Inc., Palo Alto, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/03 ; G09G 3/36 ;
U.S. Cl.
CPC ...
G02F 1/03 ; G09G 3/36 ;
Abstract

An apron and a skirt of a spatial light modulator are each coupled to a substrate by reverse-bias diodes. The spatial light modulator includes liquid crystal material between an array of electrodes and a ground electrode. The apron surrounds the array, and the segmented skirt surrounds the apron. The array, apron, and skirt are formed over the substrate. The reverse-bias diodes provide suitable electrical isolation during normal operation, but dissipate excessive charge that might accumulate during plasma etching as the modulator is being manufactured and that might otherwise induce damage due to electrostatic discharge.


Find Patent Forward Citations

Sojourner, Douglas. (2001). Liquid crystal apron and skirt isolation for silicon micro displays (U.S. Patent No. 6330099). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6330099

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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