The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Mar. 02, 1999
Applicant:
Inventor:
Yuuichi Mikata, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/131 ; H01L 2/1469 ;
U.S. Cl.
CPC ...
H01L 2/131 ; H01L 2/1469 ;
Abstract
Disclosed is a method of forming a thin film on a substrate surface by a CVD method, including the steps of arranging a substrate such that one main surface of the substrate is exposed to a closed space, and decomposing by heating a raw material gas filling the closed space so as to form a thin film containing at least one element constituting the raw material gas on the main surface of the substrate, the raw material gas containing a gas component generated by heating a material, which is solid or liquid at room temperature, arranged within the closed space.