The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Sep. 27, 1999
Koichi Terunuma, Tokyo, JP;
Tetsuya Mino, Tokyo, JP;
Katsuya Kanakubo, Tokyo, JP;
Osamu Matsuda, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
A first magnetic film to constitute a first yoke part and a first pole part is formed in a given pattern on a substrate, and a write gap film is formed on the part corresponding to the first pole portion of the first magnetic film. Then, a second magnetic film having a second pole portion and a second yoke part is formed on the write gap film by a photolithography so that the second pole portion can have a width of 1.5-2.5 &mgr;m. Thereafter, the sides of the second pole portion are etched by an ion beam etching method to narrow its width, and the write gap film is removed by using, as a mask, the second pole portion to expose the first magnetic film. Subsequently, the exposed first magnetic film is partially removed to form the first pole portion and thereby a thin film magnetic head having a pole portion with a track width of not more than 1 &mgr;m beyond the limit of the photolithography is produced.