The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Nov. 01, 1999
Applicant:
Inventors:
Masataka Nunomura, Hitachi, JP;
Masayuki Ohe, Hitachi, JP;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 ; G03F 7/30 ; G03F 7/40 ;
U.S. Cl.
CPC ...
G03F 7/023 ; G03F 7/30 ; G03F 7/40 ;
Abstract
A positive-type, heat-resistant photosensitive polymer composition comprising (a) a polyimide precursor or a polyimide which is soluble in an aqueous alkaline solution, (b) a compound capable of generating an acid when exposed to light, and (c) a compound having a phenolic hydroxyl group; a method of forming a relief pattern comprising a step of applying the composition onto a substrate and drying it thereon, a step of exposing it, a step of developing it, and a step of heating it; and an electronic part having as a surface-protecting film or an interlayer insulating film.