The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Apr. 13, 1999
Junichi Fujita, Tokyo, JP;
Fujio Shimizu, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A pattern formation method wherein a very small pattern composed of a desired element (atoms) is formed directly on a substrate by using atomic beam hologram technology. Quantum coherent reflection of an atomic wave is utilized. A coherent atomic beam is irradiated as a material wave, for example, upon a hologram of the transmission type to modulate the atomic beam with pattern information included in the hologram. The atomic beam having passed through and diffracted by the hologram is introduced to a reflecting plane so that the atomic beam may be quantum coherent reflected by the reflecting plane, and the atomic beam thus reflected is introduced into a substrate. A binary (two-value) hologram produced by computer synthesis is used suitably as the hologram. A hologram of the potential control type may be also used.