The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Mar. 02, 1999
Applicant:
Inventors:
Francis Stace Murray Clube, Neuchetel, CH;
Basil Arthur Omar, Swindon, GB;
Assignee:
Holtronic Technologies, Ltd., Marin, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/00 ; G03F 7/20 ;
U.S. Cl.
CPC ...
G03H 1/00 ; G03F 7/20 ;
Abstract
Lithography processes that use multiple layers require registration between layers. The accuracy requirement depends on the application of the lithograph. For microlithography, the registration requirement could be less than one micron. Systems that use lenses for imaging such as optical steppers can image conventional alignment marks through those lenses. A unique microlithography system that employs holograms has properties that are not compatible with known alignment techniques. The present invention is a new system for alignment of holographic microlithography elements.