The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Aug. 04, 2000
Toshiaki Anzaki, Osaka, JP;
Etsuo Ogino, Osaka, JP;
Nippon Sheet Glass Co., Ltd., Osaka, JP;
Abstract
Sputtering method and apparatus for forming a coating on both sides of a flat substrate or on the entire surface of a bulky substrate without involving rotation of the substrate. At least one pair of sputtering cathodes each having a target attached thereto are arranged in a film-forming chamber capable of controlling a vacuum atmosphere with their target sides facing each other, and a substrate is disposed in front of the targets. A voltage is applied to the sputtering cathodes in such a manner that the polarity alternates between the sputtering cathodes making the pair to induce a glow discharge between the sputtering cathodes. The target on each sputtering cathode is thereby sputtered and deposited on the substrate.