The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Apr. 26, 2000
Applicant:
Inventor:
Jean-Michel Rius, Le Havre, FR;
Assignee:
Sidel, Le Havre, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ; B05D 3/00 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ; B05D 3/00 ;
Abstract
Device for processing a container (,) using a low pressure plasma, of the type having at least one processing station (,) comprising a fixed cavity (,) connected to a vacuum source by way of a vacuum circuit (,) and of the type in which processing station (,) has a mobile cover (,) equipped with means (,) for supporting container (,) such that the introduction of the container into cavity (,) is assured by displacement of cover (,) with respect to cavity (,), characterized in that cover (,) has a connecting channel (,) which, when cover (,) is in closed position sealing cavity (,) places cavity (,) in connection with a fixed end (,) of vacuum circuit (,).