The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Nov. 15, 1999
James J. Schwab, Napa, CA (US);
EnviroCare International, Inc., Novato, CA (US);
Abstract
A compact inlet system for redirecting the flow of gas to a gas treatment apparatus is shown. The inlet system is used to redirect a high volume flow of gas, such as the effluent from an industrial process, by as much as 180° while introducing the gas flow uniformly into the treatment apparatus. The inlet system has a divergent transition section to slow the gas flow, a gas turning section to redirect the gas flow by 90°, and a gas inlet chamber which redirects the gas flow by an additional 90°, while at the same time introducing the gas flow uniformly into a treatment apparatus, such as a gas conditioning tower (GCT). The compact gas inlet chamber of the present invention has an elongate entrance, a circular outlet and a tapered midsection. When used with a GCT the greater uniformity provided by the present invention allows spray nozzles to be positioned within the throat of the entrance venturi of the GCT.