The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2001
Filed:
Nov. 04, 1999
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A shadow mask has a mask body and a substantially rectangular mask frame attached to a peripheral portion of the mask body. The mask body has a substantially rectangular curved effective surface opposed to a phosphor screen formed on an inner surface of a panel. The effective surface has a number of electron beam passage apertures. The effective surface of the mask body has a curvature in a direction of the long axis, which is set within a range of about 0 to 2×10,(1/mm) over an area from a center of the effective surface to a middle portion of the effective surface in the direction of the long axis. A curvature at a peripheral portion in the direction of the long axis is set to be greater than that at the middle portion. A curvature on the short axis in the direction of the short axis successively increases over a distance equal to at least two thirds of a distance between the center and an effective end of the short axis.