The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2001
Filed:
Mar. 17, 2000
Jorg Beersiek, Aachen, DE;
Wolfgang Schulz, Langerwehe, DE;
Abstract
A method for treating materials with plasma-inducing high-energy radiation, especially laser radiation, where an area of vapor capillaries (,) of a work piece (,) is observed with a depth definition detecting device over the entire thickness of the work piece and time-dependent measurement of plasma radiation intensity is carried out. In order to accurately monitor the quality of material treatment, the method is implemented in such a way that the momentary plasma intensities are measured at no less than two measurement points which are parallel to an axis (,) of inducing radiation (,). Predetermined capillary parameters are assigned to the measured plasma intensities and control of the material treatment is conducted depending on the capillary geometric parameters.