The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2001
Filed:
Feb. 10, 2000
Kunio Watanabe, Tenri, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A phase-shifting mask includes a transparent substrate and a pattern formed of a translucent film on the transparent substrate. One of two regions of the substrate along both sidewalls of a trace of the pattern has a recess such that phases of exposure light passing through the two regions are 180° inverse to each other. The trace has different thicknesses on its sides adjacent to the two regions of the substrate so that phases of exposure light passing through the one region of the substrate and one side of the trace adjacent thereto are 180° inverse to each other and phases of exposure light passing through the other of the two regions of the substrate and the other side of the trace adjacent thereto are 180° inverse to each other.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile