The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2001
Filed:
Sep. 18, 1998
Applicant:
Inventor:
James A. Stinnett, Mountain View, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 5/00 ;
U.S. Cl.
CPC ...
B08B 5/00 ;
Abstract
A method of cleaning a substrate,to remove etchant residue,formed during etching of the substrate, the method comprising the step of exposing the substrate in a process zone,, to an activated cleaning gas comprising halogen-substituted saturated hydrocarbon gas, oxygen gas, and nitrogen gas.
Stinnett, James. (2001). Method for etching and cleaning a substrate (U.S. Patent No. 6325861). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6325861
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile