The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2001
Filed:
Sep. 13, 1999
Applicant:
Inventor:
Shuji Onoue, Hiratska, JP;
Assignee:
Komatsu Electronic Metals Co., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 1/520 ;
U.S. Cl.
CPC ...
C30B 1/520 ;
Abstract
SLH, CLH, and an output of the weight sensor enter a main control section to calculate MD, MDD, and WEL. The main control section makes up a negative-loop for stable automatic control. This section calculates GR(GL), SLC(GWD), SLC(MP), and SLC(WEL) for SL and CL control, and calculates crucible moving rate from GD(GL) and CI(MD), and determines SL and CL by using these parameters to control crystal-growing.
Onoue, Shuji. (2001). Crystal manufacturing apparatus and method (U.S. Patent No. 6325851). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6325851
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile