The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2001

Filed:

May. 11, 1999
Applicant:
Inventor:

Larry J. Hornbeck, Van Alstyne, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 2/608 ;
U.S. Cl.
CPC ...
G02B 2/608 ;
Abstract

A high-yield micromirror device and fabrication method. Address electrodes (,) and a separate mirror bias/reset conductor (,) are disposed on a substrate (,). A micromirror superstructure including torsion beam support posts (,), torsion beam hinges (,), a torsion beam yoke (,), a mirror support post (,), and a mirror (,) is fabricated above, and electrically connected to, the mirror bias/reset conductor (,) such that the torsion beam yoke (,) and mirror (,) are suspended above the address electrodes (,). A dielectric layer (,) is formed over the address electrodes (,). The dielectric layer (,), coupled with the elimination of upper address electrodes used in the prior art electrically insulates the address electrodes (,) from contact with the mirror superstructure and prevents conductive debris from shorting either the mirror superstructure or mirror bias/reset conductor (,) to the address electrodes (,).


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