The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2001

Filed:

Nov. 12, 1999
Applicant:
Inventor:

Tatsuyuki Miura, Yokohama, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 2/600 ; G03G 1/504 ;
U.S. Cl.
CPC ...
G02B 2/600 ; G03G 1/504 ;
Abstract

An exposure apparatus emits a number of laser beams to the predetermined positions on a single photosensitive drum. Galvano-mirrors are employed for controlling the distances between the laser beams in the main scanning direction and the sub-scanning direction. The angles of the mirrors of the galvano-mirrors are adjusted in such a manner as to eliminate the adverse effects caused by a drift, such as variations in the viscosity of the dampening agent of a mirror driving mechanism and variations in the magnetic force generated by a magnetic circuit. Without such adverse effects, the laser beams can be guided accurately to the predetermined positions on the photosensitive drum. The angles of the mirrors are monitored by checking whether the laser beams are incident on the predetermined positions on the detection areas of a beam position sensor.


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