The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2001
Filed:
Mar. 24, 1999
Masakuni Yamamoto, Yamato, JP;
Koichiro Nishikawa, Takasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of exposure to a light pattern containing a first strip-shaped portion extending in a first direction and a second strip-shaped portion extending in a second direction comprises steps of placing, on a light-receiving face, a first mask having a strip-shaped slit corresponding to the first strip-shaped portion extending in a first direction of the pattern, projecting, to the first mask, a first linearly polarized light beam polarized in the second direction to irradiate the light-receiving face through the slit of the first mask, removing the first mask from the light-receiving face, and placing, on the light-receiving face, a second mask having a strip-shaped slit corresponding to the second strip-shaped portion extending in a second direction of the pattern and projecting, to the second mask, a second linearly polarized light beam polarized in the first direction to irradiate the light-receiving face through the slit of the second mask.