The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2001
Filed:
Dec. 29, 1999
Shigemi Ohtsu, Ashigarakami-gun, JP;
Eiichi Akutsu, Ashigarakami-gun, JP;
Lyong Sun Pu, Ashigarakami-gun, JP;
Fuji Xerox Co., Ltd., Tokyo, JP;
Abstract
An image is formed by a process comprising the steps of: preparing a substrate comprising a transparent substrate having formed thereon a transparent electroconductive film and a semiconductor thin film in this order; preparing in a vessel, which can hold an liquid, an aqueous liquid containing a coloring material and an electrodepositable material capable of chemically dissolving or sedimanting/precipitating depending on the change in the pH; connecting a device than can supply an electric current or an electric field in accordance with an image pattern to the transparent electroconductive film of the substrate; fixing the substrate so that the semiconductor thin film is immersed in the aqueous liquid; disposing a counter electrode as another member of an electrode pair in the vessel; disposing a prescribed photomask on the transparent substrate of the substrate; and carrying out light irradiation at the transparent substrate through the photomask so that an electrodeposited film containing the electrodepositable material is formed selectively on portions where electromotive force is generated by the light irradiation.