The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2001
Filed:
Dec. 22, 1998
Other;
Abstract
A managing system for managing slurry, which is used to machine workpieces. The slurry contains dispersion liquid and abrasive grains. Slurry that has been used in machining further includes impurities that are smaller than the abrasive grains. A first decanter centrifugally separates a mixture of impurities and dispersion liquid from the used slurry to recover recyclable abrasive grains from the slurry. A second decanter centrifugally separates impurities from the mixture to recover recyclable dispersion liquid from the slurry. A specific gravity gage and a viscosity gage detect properties of the used slurry. The rotating speeds of the first and second decanters are controlled in accordance with the detected properties of the slurry. This always maintains the separating efficiency of both decanters at an optimal value thus effectively recovering and recycling the abrasive grains and dispersion liquid.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile