The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2001

Filed:

Sep. 07, 1999
Applicant:
Inventors:

Dalibor Hodko, College Station, TX (US);

Jeffrey Dillon, Bryan, TX (US);

Waheguru Pal Singh, College Station, TX (US);

Oliver J. Murphy, Bryan, TX (US);

Assignee:

Lynntech, INC, College Station, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 5/02 ;
U.S. Cl.
CPC ...
C25D 5/02 ;
Abstract

An apparatus is disclosed having at least one cathode adapted to maintain a line of contact with at least one substrate surface during relative movement therebetween. There is at least one anode located in a spaced relationship to the cathode and an electronically insulating member located between the at least one anode and the at least one cathode adapted to provide a gap between the substrate surface and the insulating member. When placed in a plating bath, the electric field is directed toward conducting patterns on a substrate to uniformly plate the patterns while minimizing plating on the electrode. The same device may also be used for electroetching by reversing the polarity of the electrodes.


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