The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2001
Filed:
Jul. 06, 2000
Wilmert De Bosscher, Drongen, BE;
Dirk Cnockaert, Deinze, BE;
Sinvaco N.V., , BE;
Abstract
The present invention provides a planar magnetron including a surface for mounting a planar substantially polygonal target (,) having a substantially central target area for sputtering onto a substrate. The magnetron comprises an array of magnets (,) defining a closed loop magnetic field for generating an elongated plasma race-track above the target (,). Means for establishing cyclical, relative, substantially translational movement between the race-track and the target support surface are provided, the substantially translational movement being substantially parallel to this surface and the trace of the substantially translational movement being a two-dimensional figure. The periphery of the race-track lies substantially within said substantially central target area throughout each cycle, the establishing means being adapted to provide a substantially uniform erosion of the target (,) at least within said substantially central target area.