The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2001
Filed:
Jun. 09, 1999
Hans-Georg Fritsche, Bobbau, DE;
Udo Peper, Wittenberg, DE;
Frank Neubauer, Weissandt-Gölzau, DE;
Hartwig Schaper, Aschaffenburg, DE;
Jürgen Röper, Roitzsch, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
In a known process for the manufacture of an elongated porous SiO,preform, SiO,particles are deposited on the mantle surface of a cylindrical carrier rotating about its longitudinal axis. The SiO,particles are formed by means of a plurality of deposition burners which are arranged, at a distance from one another, in at least one burner row extending parallel to the longitudinal axis of the carrier. The burners are moved in a repeated cycle back and forth along the forming preform and between turnaround points where the direction of their motion is reversed. Measures are taken in the process to prevent or reduce overheating of the preform in the turnaround point regions. These measures can lead to variations in the rate of deposition. In order to prevent this it is proposed according to the invention that the measures comprise localized removal of heat from the turnaround points (,), or a localized heat shielding of the regions (,) around the turnaround points (,), and that these measures be kept time-constant within a motion cycle. As far as concerns an apparatus suitable for implementation for the manufacture of a porous SiO,preform, with a cylindrical carrier rotatable about its longitudinal axis, with a plurality of deposition burners arranged in at least one burner row extending parallel to the carrier's longitudinal axis, connected with one another and at a distance from one another and with a jogging device which moves the deposition burners along the carrier and between turnaround points where the direction of the motion is reversed and by means of which burners SiO,particles are deposited on the carrier, forming the preform, it is proposed that heat sinks (,) be provided in the regions (,) around the turnaround points (,).