The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2001
Filed:
Feb. 26, 2001
Karl-Heinz Ahrweiler, Willich, DE;
Eduard Kusters Maschinenfabrik GmbH & Co. KG, Krefeld, DE;
Abstract
The device (,) is used to apply a treatment medium to a moving strip of material (W) e.g. a dyebath to a strip of carpet. The device (,) is composed of a rigid support (,) that is securely arranged in a machine frame (,) and extends in a perpendicular position with respect to the strip of material, an inflatable pressure cushion (,) extending along the support (,), a less rigid supporting beam (,) arranged on the pressure cushion (,) with ends that are mounted in an articulating manner on the machine frame (,) around axes (,) that are parallel to the strip of material, in addition to an application beam (,) placed on the supporting beam (,) in perpendicular position with respect to the strip of material (W) and running parallel to the surfaces thereof, whereby the application beam rests upon the strip of material (W) with the aid of a sliding surface. An application slit (,) that opens out onto the sliding surface (,) in placed in the vicinity thereof. Feed pipes for the treatment medium are arranged along the length of the application slit (,) and lead thereto. A support roller (,), running parallel to the application slot (,) and located opposite thereto, and a device that engages with the support roller (,) to adjust the gap (,) between the support roller (,) and the application beam (,) are provided on the other side of the strip of material (W).