The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2001
Filed:
Jul. 20, 1999
Applicant:
Inventor:
Takashi Mouri, Tokyo, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/732 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/732 ;
Abstract
An exposure apparatus exposes a substrate to a pattern on a reticle in accordance with a job transferred to the apparatus proper and by executing predetermined calibration processing. The apparatus has a function which, when a job and a reticle used in exposure of a substrate in a current lot are the same as a job and a reticle that were used in exposure of a substrate in a preceding lot, bypasses re-transfer of a job to the apparatus proper and/or the calibration processing in regard to exposure of the current lot.