The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2001

Filed:

Jun. 03, 1999
Applicant:
Inventors:

Mitsuru Inoue, Utsunomiya, JP;

Nobushige Korenaga, Utsunomiya, JP;

Yukio Tokuda, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/758 ; G03B 2/762 ; G05G 1/100 ; G05B 1/06 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/758 ; G03B 2/762 ; G05G 1/100 ; G05B 1/06 ;
Abstract

A stage system includes a movable stage, a guide mechanism for guiding the stage with respect to a predetermined direction, and a preloading mechanism for producing a magnetic attraction force with which the rigidity of the guide mechanism can be increased, wherein a portion to be attracted by the magnetic attraction force is made of a material having a product of a residual magnetic flux density Br and a holding force Hc in a hysteresis curve, not greater than 100 J/m,, this being very effective to reduce the hysteresis force, which is resistance due to the residual magnetic force, as compared with the preloading attraction force, whereby high precision positioning of the stage is accomplished.


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