The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2001

Filed:

Jun. 01, 2000
Applicant:
Inventors:

Chung Suk Kang, Seoul, KR;

Sung Mo Park, Suwon, KR;

Kap Sung Lee, Seoul, KR;

Assignee:

Kolon Industries, Inc., Kyunggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 8/300 ;
U.S. Cl.
CPC ...
C08L 8/300 ;
Abstract

A PMMA resin containing an impact modifier capsulated therein, said impact modifier comprising a core of a glass polymer, an intermediate layer of a rubber copolymer grafted to the core and an outer layer of a glass polymer grafted to the intermediate layer, the impact modified PMMA resin having a granular shape, the amount of the core being 5 to 20 weight %, the amount of the intermediate layer being 10 to 70 weight % and the amount of the outer layer being 25 to 85 weight %, the intermediate of the rubber copolymer being a copolymer of at least one monomer selected from the group consisting of butylacrylate and butadiene and a monomer of styrene, the outer layer of a glass polymer containing a chain transfer agent.


Find Patent Forward Citations

Loading…