The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2001
Filed:
Aug. 24, 1999
Hiroshi Kamohara, Tokyo, JP;
Makiko Takeo, Tokyo, JP;
GC Corporation, Tokyo, JP;
Abstract
A marginal treatment material of a denture base, comprising (A) 100 parts by weight of an organopolysiloxane having at least two aliphatic unsaturated hydrocarbons in one molecule and having a viscosity of 500˜5,000 cs at 25° C.; (B) 0.5˜30 parts by weight of an organohydrogen polysiloxane having at least three hydrogen atoms directly bonded to a silicon atom in one molecule; (C) 10˜500 ppm, based on the total of the components (A) and (B), of a silicone-soluble platinum compound; and (D) 0.5˜20 parts by weight of fine silica powder having a BET specific surface area of 50˜500 m,/g, whose surface is made hydrophobic. A marginal treatment method of a denture base is also disclosed, comprising applying the marginal treatment material of the denture base to a marginal portion of a denture base lined by a soft lining material, followed by curing, and by applying the marginal treatment material to a border line between the denture base in the denture marginal portion and the soft lining material, followed by curing, can be easily form without polishing a smooth transitional surface.