The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2001
Filed:
Sep. 27, 2000
Applicant:
Inventors:
Lloyd A. Lobo, Webster, NY (US);
Tiecheng A. Qiao, Webster, NY (US);
Brian J. Kelley, Farmington, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/305 ;
U.S. Cl.
CPC ...
G03C 5/305 ;
Abstract
The present invention is also directed to a method of photoprocessing a photographic imaging element having a processing-solution-permeable overcoat that comprises at least one water-dispersible hydrophobic polymer interspersed with a water-soluble hydrophilic polymer. During photoprocessing, a surface-active water-soluble hydrophilic polymer is leached into a photoprocessing solution. However, foaming due to the hydrophilic polymer in the photoprocessing solution is prevented by the presence of a non-ionic surfactant having an HLB of less than 12.