The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2001

Filed:

Dec. 28, 1999
Applicant:
Inventors:

Tetsuro Sasaki, Tokyo, JP;

Hiroaki Kawashima, Tokyo, JP;

Assignee:

TDK Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 ;
U.S. Cl.
CPC ...
B05D 5/12 ;
Abstract

A method of manufacturing a MR sensor having at least an anti-ferromagnetic layer and a ferromagnetic layer, and to a method for manufacturing a magnetic head with the MR sensor. The sensor utilizes bias magnetic field provided by exchange coupling between the anti-ferromagnetic layer and the ferromagnetic layer. The sensor manufacturing method includes a step of depositing an anti-ferromagnetic layer to have a larger thickness than a target thickness, a step of ordering the deposited anti-ferromagnetic layer, and a step of thinning the ordered anti-ferromagnetic layer to have the target thickness.


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