The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2001
Filed:
Jan. 13, 1999
Marc Delaunay, Meylan, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
A linear microwave plasma source comprises a leaktight chamber (,) under negative pressure and a microwave injection guide (,) that ends in a 90° elbow (,) opening perpendicularly into the chamber, a leaktight microwave window,) being placed between the microwave injection guide (,) and the 90° elbow (,) such that they cause ionization of the gas in a zone (,) of electron cyclotron resonance located a few centimeters inside the elbow (,) that is under negative pressure. First and second permanent magnets (,) are disposed on either side of said window (,), said magnets (,) being installed with alternating polarity. A sputtering target (,) is located inside the plasma stream and electrically insulated from the chamber and charged with a negative polarity, and means (,) for injecting gas for controlling the ionic species of the plasma stream are provided.