The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2001
Filed:
Feb. 16, 2000
Ryoichi Hiratsuka, Miyagi, JP;
Kikuji Kawakami, Miyagi, JP;
Yoshihito Ebine, Miyagi, JP;
Atsuhiro Abe, Miyagi, JP;
Yukihiro Koshika, Miyagi, JP;
Sony Corporation, Tokyo, JP;
Abstract
It is to provide an apparatus for producing a thin film, a process for producing a thin film and a guide roller, in which an arc resistant property is provided, and the film formation can be stably conducted with preventing damage of the thin film thus formed. In an apparatus for producing a thin film, such as a plasma CVD apparatus, comprising a vacuum chamber, means for generating a plasma in the vacuum chamber, means for introducing a gas to the vacuum chamber, and a guide roller for running a material to be treated by winding and supporting in the vacuum chamber, an outer peripheral surface of the guide roller in contact and sliding with the material to be treated comprises an electric conductor on both end parts in a width direction of the guide roller, and an electric insulator on a central part thereof.