The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2001
Filed:
Apr. 13, 2000
Mao Wang, Sunnyvale, CA (US);
John C. Tsai, Saratoga, CA (US);
Excel Precision Corp., Santa Clara, CA (US);
Abstract
A measurement apparatus (,) and methods to perform positional types of measurement with normalization respective to either or both of light beam (,) intensity and measurement target (,) reflectivity. A light source, such as a laser diode (,), produces a light beam (,) which is directed at the measurement target (,). One or more beamsplitters (,) in the path of the light beam (,) direct sample portions into one or more photodetectors (,) to obtain either or both of illumination and reflectivity sample values. A portion of the light beam (,) which is reflected by the measurement target (,) is passed through and restricted by an aperture (,) and then detected by a position sensitive detector (,) to obtain a position value. The position value may then be normalized based on either or both of the illumination and reflectivity sample values.