The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2001
Filed:
Jul. 18, 1997
Applicant:
Inventors:
Jae Chang Jung, Kyungki-do, KR;
Chi Hyeong Roh, Kyungki-do, KR;
Assignee:
Hyundai Electronics Industries Co., Ltd., Ichon-shi, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/240 ;
U.S. Cl.
CPC ...
C08F 2/240 ;
Abstract
A novel copolymer useful for photoresist, which allows a formation of patterns showing a significantly improved resolution in a photolithography using ArF (193 nm) light source, is prepared by copolymerizing at least two cycloaliphatic olefins with an amide or imide.
Jung, Jae. (2001). Amide- or imide-introduced copolymer, preparation thereof and a photoresist comprising the same (U.S. Patent No. 6316565). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6316565
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile