The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2001
Filed:
Mar. 30, 1999
Applicant:
Inventors:
Theodorus Gerardus Maria Oosterlaken, Oudewater, NL;
Frank Huussen, Bilthoven, NL;
Remco Van Der Berg, Lelystad, NL;
Assignee:
ASM International N.V., Bilthoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/131 ; H01L 2/1469 ;
U.S. Cl.
CPC ...
H01L 2/131 ; H01L 2/1469 ;
Abstract
Method for the chemical treatment of a semiconductor substrate at a raised temperature, such as oxidization. To achieve a uniform treatment of comparatively large wafers in the radial direction, as well as to realize a uniform treatment during the simultaneous treatment of a number of semiconductor substrates placed one after each other, it is proposed, starting with an inert atmosphere, to gradually add oxygen and at the end of the treatment to gradually reduce the oxygen portion.
Published as:
NL1008749C2; US6316371B1;